|
The
programmable Genius deposition controller regulates all aspects of the
electron beam deposition process. As well as controlling the high voltage
and regulating the filament supply, the Genius also handles the magnet
current supply to the coils of the electron beam evaporator.
All
of the Genius functions are included on the remote control which can be
used to manually set and control the evaporation process as well as to
set all process and system parameters. Access to the menu functions may
be limited with three password protected user levels.
In
order to achieve the best in film quality and uniform evaporant utilization,
the genius can store a wide variety of evaporation parameters. Different
data sets can then be applied to different phases of the process (eg.
material melting and various coating phases). In addition to storing various
beam sweep parameters, different high voltage values may also be set.
The
Genius, used with a Carrera series power supplies allows up to three electron
beam sources to be run from a single power supply. |
